Applied Physics and Mathematics Annotation << Back ATOMIC LAYER DEPOSITION METHODS FOR THE PRODUCTION OF THIN FILMS INDIUM OXIDE DOPED WITH TIN K.V. CHIZH Methods of applying optically transparent thin films In2 O3 are considered in the work:Sn (ITO) application modes and comparison of films obtained by various deposition processes are given by various atomic layer deposition methods. The growth rate of films for different deposition processes is shown and the optimal deposition temperatures are determined. The process of plasma-stimulated atomic layer deposition of films to reduce the deposition temperature is considered. The characteristics of the obtained films are generalized taking into account the peculiarities of the synthesis process. Keywords: atomic layer deposition, thin films, tin-doped indium oxide, ITO, optically transparent contacts. DOI: 10.25791/pfi m.05.2024.1310 Pp. 39-47.